R&D
Cleaning Development
● Support the best Cleaning Condition of the Customer Process run better
‧ Fewer Defect
‧ Shorter Delivery Time
● New Cleaning Development to Support the New Material
● Surface Morphology (3D Laser Microscope)
● Chemical Durability
‧ Thickness Lose (Sub. Material)
‧ Hole Size Deviation (AOI)
● Contamination Removal Ratio
(X-Ray, EDX, ICP-MS)
APS Coating Development
● Support the best APS Coating Material of the Customer Process run better.
‧ Long PM Cycle and Life Time
‧ Lower Particle Generation
‧ Low Cost
● Growth Rate & THK
● Roughness
● Porosity
● Hardness
● Adhesion
● Breakdown Voltage
● Composition
● Material Structure
● Surface Image
● Chemical Durability
● Plasma Durability
● Cleaning Performance
New Material & Product Development
● APS (Atmospheric Plasma Spraying)
● SPS (Suspension Plasma Spraying)
● SHD (Superior High Density)
● Innovation and improvement solution patents
